File:Ion implanter schematic.png

Summary

DescriptionIon implanter schematic.png	Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of U_accell and U_decell. Image created using Tgif.
Date	3 July 2005
Source	Own work
Author	Daniel Schwen
Other versions	Russian .svg English .svg

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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.

	This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.

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	This licensing tag was added to this file as part of the GFDL licensing update.CC BY-SA 3.0truetrue

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