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Summary
| Description |
Illustration of the four main steps of a nanosphere lithography process, depicting the sequence of: (a) the deposition of colloidal nano/micro-particles on a surface, which will act as mask; (b) reactive ion etching (RIE) for particle shaping, producing a non-close packed array; (c) material infiltration via physical deposition; (d) lift-off of the colloids leaving only the nano/micro-patterned material in between the particles. Image reused from: https://www.mdpi.com/2079-4991/11/7/1665 with permission from MDPI. |
| Date | |
| Source | Own work |
| Author | Manuelmdm |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 11:54, 19 March 2023 | | 550 × 414 (73 KB) | Manuelmdm | Uploaded own work with UploadWizard |
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