800 nm process

Semiconductor device fabrication
MOSFET scaling (process nodes)
020 µm – 1968 010 µm – 1971 006 µm – 1974 003 µm – 1977  1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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The 800 nanometer process (800 nm process) is a level of semiconductor process technology that was reached in the 1989–1990 timeframe, by most leading semiconductor companies, such as Intel, ATI Technologies, and IBM.^[1]

Products featuring 800 nm manufacturing process

• 50-MHz i486DX CPU launched in 1991 was manufactured using this process.^[2]
• microSPARC I launched in 1992
• First Intel P5 Pentium CPUs at 60 MHz and 66 MHz launched in 1993

References

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This page was last edited on 15 February 2024, at 14:03